Laser Annealing Processes in Semiconductor Technology

• Author : Fuccio Cristiano,Antonino La Magna
• Publisher : Woodhead Publishing
• Release : 21 April 2021

Laser Annealing Processes in Semiconductor Technology: Theory, Modeling and Applications in Nanoelectronics synthesizes the scientific and technological advances of laser annealing processes for current and emerging nanotechnologies. The book provides an overview of the laser-matter interactions of materials and recent advances in modeling of laser-related phenomena, with the bulk of the book focusing on current and emerging (beyond-CMOS) applications. Reviewed applications include laser annealing of CMOS, group IV semiconductors, superconducting materials, photonic materials, 2D materials. This comprehensive book is ideal

• Author : Simeon M. Metev,Vadim P. Veiko
• Publisher : Springer Science & Business Media
• Release : 09 March 2013

Laser-Assisted Microtechnology introduces the principles and techniques of laser-assisted microtechnology with emphasis on micromachining of thin films, microprocessing of materials, maskless laser micropatterning and laser-assisted synthesis of thin-film systems. The experimental and theoretical physico-chemical basis of every technological process is presented in detail. On the basis of some characteristic examples of applications, the capabilities of the technological methods as well as the optimum conditions for their realization are discussed. In this second edition, besides the actualization of the literature, a

• Author : Anonim
• Publisher : Unknown
• Release : 21 March 1986

• Author : F. Roozeboom,P.J. Timans,K. Kakushima,H. Jagannathan,Z. Karim,E. P. Gusev,S. De Gendt
• Publisher : The Electrochemical Society
• Release : 04 May 2018

• Author : F. Roozeboom,P. J. Timans,K. Kakushima,E. Gusev,Z. Karim,D. Misra,Y. S. Obeng,S. De Gendt,H. Jagannathan
• Publisher : The Electrochemical Society
• Release : 17 May 2019

This issue of ECS Transactions includes papers based on presentations from the symposium "Silicon Compatible Emerging Materials, Processes, and Technologies for Advanced CMOS and Post-CMOS Applications 9," originally held at the 235th ECS Meeting in Dallas, Texas, May 26-30, 2019.

• Author : Jonathan R. Lawrence
• Publisher : Elsevier
• Release : 27 July 2010

Because of its capacity for continuous development and flexibility of use, the laser has become a mainstream manufacturing tool in many industrial sectors. This timely book relays the state-of-the-art in laser materials processing technology and applications and likely advances to be made from current research taking place around the world. The book also promotes appreciation for laser applications in a variety of industrial sectors. After two introductory chapters, the book reviews the main areas of laser processing. Starting with laser

• Author : Ming Yang
• Publisher : Unknown
• Release : 21 March 2023

• Author : Fred Chernow
• Publisher : Springer Science & Business Media
• Release : 06 December 2012

The Fifth International Conference on Ion Implantation took place in Boulder, Colorado between the 9th and 13th of August 1976. Papers were delivered by scientists and engineers from 15 countries, and the attendees represented 19 countries. As has become the custom at these conferences, the sessions were intense with the coffee breaks and evenings given to informal meetings among the participants. It was a time to renew old friendships, begin new ones, exchange ideas, personally question authors of papers that appeared in the

• Author : Cor L. Claeys
• Publisher : The Electrochemical Society
• Release : 21 March 2023

The symposium provided a forum for reviewing and discussing all aspects of process integration, with special focus on nanoscaled technologies, 65 nm and beyond on DRAM, SRAM, flash memory, high density logic-low power, RF, mixed analog-digital, process integration yield, CMP chemistries, low-k processes, gate stacks, metal gates, rapid thermal processing, silicides, copper interconnects, carbon nanotubes, novel materials, high mobility substrates (SOI, sSi, SiGe, GeOI), strain engineering, and hybrid integration.

• Author : Dim-Lee Kwong,Electrochemical Society. Electronics Division,Electrochemical Society. High Temperature Materials Divisions
• Publisher : The Electrochemical Society
• Release : 21 March 2023

"Electronics, Dielectric Science and Technology, and High Temperature Materials Divisions."

• Author : Wolfgang Skorupa,Heidemarie Schmidt
• Publisher : Springer Science & Business Media
• Release : 16 December 2013

The thermal processing of materials ranges from few fem to seconds by Swift Heavy Ion Implantation to about one second using advanced Rapid Thermal Annealing. This book offers after an historical excursus selected contributions on fundamental and applied aspects of thermal processing of classical elemental semiconductors and other advanced materials including nanostructures with novel optoelectronic, magnetic, and superconducting properties. Special emphasis is given on the diffusion and segregation of impurity atoms during thermal treatment. A broad range of examples describes

• Author : J Poate
• Publisher : Elsevier
• Release : 02 December 2012

Laser Annealing of Semiconductors deals with the materials science of surfaces that have been subjected to ultrafast heating by intense laser or electron beams. This book is organized into 13 chapters that specifically tackle transient annealing of compound semiconductors. After briefly dealing with an overview of laser annealing, this book goes on discussing the concepts of solidification and crystallization pertinent to the field. These topics are followed by discussions on the main mechanisms of interaction of photon and electron beams with

• Author : Denise Reichel
• Publisher : Springer
• Release : 07 January 2016

Denise Reichel studies the delicate subject of temperature measurement during lamp-based annealing of semiconductors, in particular during flash lamp annealing. The approach of background-correction using amplitude-modulated light to obtain the sample reflectivity is reinvented from rapid thermal annealing to apply to millisecond annealing. The author presents a new method independent of the lamp operation to obtain this amplitude modulation and derives a formula to describe the process. Further, she investigates the variables of the formula in depth to validate the

• Author : Chun Li Bai,Si Shen Xie,Xing Zhu
• Publisher : Trans Tech Publications Ltd
• Release : 15 March 2007

Volume is indexed by Thomson Reuters CPCI-S (WoS). Nanotechnology has been a priority research field in many countries, because new discoveries in this field have the potential power to unravel new phenomena and new principles of materials use. This collection of knowledge concerning frontier issues in nanotechnology will aid the further promotion of the integration of nanotechnology and industry.

• Author : Howard R. Huff,Rudolph J. Kriegler,Yoshiyuki Takeishi
• Publisher : Unknown
• Release : 21 March 1981