High Power Impulse Magnetron Sputtering

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  • Author : Daniel Lundin
  • Publisher : Unknown
  • Pages : 398 pages
  • ISBN : 0128124547
  • Rating : /5 from reviews
CLICK HERE TO GET THIS BOOK >>>High Power Impulse Magnetron Sputtering

Download or Read online High Power Impulse Magnetron Sputtering full in PDF, ePub and kindle. this book written by Daniel Lundin and published by Unknown which was released on 13 September 2019 with total page 398 pages. We cannot guarantee that High Power Impulse Magnetron Sputtering book is available in the library, click Get Book button and read full online book in your kindle, tablet, IPAD, PC or mobile whenever and wherever You Like. High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution. Includes a comprehensive description of the HiPIMS process from fundamental physics to applications Provides a distinctive link between the process plasma and thin film communities Discusses the industrialization of HiPIMS and its real world applications

High Power Impulse Magnetron Sputtering

High Power Impulse Magnetron Sputtering
  • Author : Daniel Lundin,Jon Tomas Gudmundsson,Tiberiu Minea
  • Publisher : Unknown
  • Release : 13 September 2019
GET THIS BOOK High Power Impulse Magnetron Sputtering

High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with

Discharge Physics of High Power Impulse Magnetron Sputtering

Discharge Physics of High Power Impulse Magnetron Sputtering
  • Author : Anonim
  • Publisher : Unknown
  • Release : 16 May 2022
GET THIS BOOK Discharge Physics of High Power Impulse Magnetron Sputtering

High power impulse magnetron sputtering (HIPIMS) is pulsed sputtering where the peak power exceeds the time-averaged power by typically two orders of magnitude. The peak power density, averaged over the target area, can reach or exceed 107 W/m2, leading to plasma conditions that make ionization of the sputtered atoms very likely. A brief review of HIPIMS operation is given in a tutorial manner, illustrated by some original data related to the self-sputtering of niobium in argon and krypton. Emphasis is