High Power Impulse Magnetron Sputtering

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  • Author : Daniel Lundin
  • Publisher : Elsevier
  • Pages : 398 pages
  • ISBN : 0128124555
  • Rating : 5/5 from 1 reviews
CLICK HERE TO GET THIS BOOK >>>High Power Impulse Magnetron Sputtering

Download or Read online High Power Impulse Magnetron Sputtering full in PDF, ePub and kindle. this book written by Daniel Lundin and published by Elsevier which was released on 28 August 2019 with total page 398 pages. We cannot guarantee that High Power Impulse Magnetron Sputtering book is available in the library, click Get Book button and read full online book in your kindle, tablet, IPAD, PC or mobile whenever and wherever You Like. High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution. Includes a comprehensive description of the HiPIMS process from fundamental physics to applications Provides a distinctive link between the process plasma and thin film communities Discusses the industrialization of HiPIMS and its real world applications

High Power Impulse Magnetron Sputtering

High Power Impulse Magnetron Sputtering
  • Author : Daniel Lundin,Tiberiu Minea,Jon Tomas Gudmundsson
  • Publisher : Elsevier
  • Release : 28 August 2019
GET THIS BOOK High Power Impulse Magnetron Sputtering

High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with

Discharge Physics of High Power Impulse Magnetron Sputtering

Discharge Physics of High Power Impulse Magnetron Sputtering
  • Author : Anonim
  • Publisher : Unknown
  • Release : 22 June 2021
GET THIS BOOK Discharge Physics of High Power Impulse Magnetron Sputtering

High power impulse magnetron sputtering (HIPIMS) is pulsed sputtering where the peak power exceeds the time-averaged power by typically two orders of magnitude. The peak power density, averaged over the target area, can reach or exceed 107 W/m2, leading to plasma conditions that make ionization of the sputtered atoms very likely. A brief review of HIPIMS operation is given in a tutorial manner, illustrated by some original data related to the self-sputtering of niobium in argon and krypton. Emphasis is

Deposition Rates of High Power Impulse Magnetron Sputtering

Deposition Rates of High Power Impulse Magnetron Sputtering
  • Author : Anonim
  • Publisher : Unknown
  • Release : 22 June 2021
GET THIS BOOK Deposition Rates of High Power Impulse Magnetron Sputtering

Deposition by high power impulse magnetron sputtering (HIPIMS) is considered by some as the new paradigm of advanced sputtering technology, yet this is met with skepticism by others for the reported lower deposition rates, if compared to rates of more conventional sputtering of equal average power. In this contribution, the underlying physical reasons for the rate changes are discussed, including (i) ion return to the target and self-sputtering, (ii) the less-than-linear increase of the sputtering yield with increasing ion energy, (

High Power Impulse Magnetron Sputtering and Related Discharges

High Power Impulse Magnetron Sputtering and Related Discharges
  • Author : Anonim
  • Publisher : Unknown
  • Release : 22 June 2021
GET THIS BOOK High Power Impulse Magnetron Sputtering and Related Discharges

High power impulse magnetron sputtering (HIPIMS) and related self-sputtering techniques are reviewed from a viewpoint of plasma-based ion implantation and deposition (PBII & D). HIPIMS combines the classical, scalable sputtering technology with pulsed power, which is an elegant way of ionizing the sputtered atoms. Related approaches, such as sustained self-sputtering, are also considered. The resulting intense flux of ions to the substrate consists of a mixture of metal and gas ions when using a process gas, or of metal ions only

Plasma anti assistance And self assistance to High Power Impulse Magnetron Sputtering

Plasma anti assistance  And self assistance  to High Power Impulse Magnetron Sputtering
  • Author : Anonim
  • Publisher : Unknown
  • Release : 22 June 2021
GET THIS BOOK Plasma anti assistance And self assistance to High Power Impulse Magnetron Sputtering

A plasma assistance system was investigated with the goal to operate high power impulse magnetron sputtering (HiPIMS) at lower pressure than usual, thereby to enhance the utilization of the ballistic atoms and ions with high kinetic energy in the film growth process. Gas plasma flow from a constricted plasma source was aimed at the magnetron target. Contrary to initial expectations, such plasma assistance turned out to be contra-productive because it led to the extinction of the magnetron discharge. The effect

Method and Apparatus for Improved High Power Impulse Magnetron Sputtering

Method and Apparatus for Improved High Power Impulse Magnetron Sputtering
  • Author : Anonim
  • Publisher : Unknown
  • Release : 22 June 2021
GET THIS BOOK Method and Apparatus for Improved High Power Impulse Magnetron Sputtering

A high power impulse magnetron sputtering apparatus and method using a vacuum chamber with a magnetron target and a substrate positioned in the vacuum chamber. A field coil being positioned between the magnetron target and substrate, and a pulsed power supply and/or a coil bias power supply connected to the field coil. The pulsed power supply connected to the field coil, and the pulsed power supply outputting power pulse widths of greater that 100 .mu.s.

High Power Impulse Magnetron Sputtering

High Power Impulse Magnetron Sputtering
  • Author : Anonim
  • Publisher : Unknown
  • Release : 22 June 2021
GET THIS BOOK High Power Impulse Magnetron Sputtering

The commonly used current-voltage characteristics are foundinadequate for describing the pulsed nature of the high power impulsemagnetron sputtering (HIPIMS) discharge, rather, the description needs tobe expanded to current-voltage-time characteristics for each initial gaspressure. Using different target materials (Cu, Ti, Nb, C, W, Al, Cr) anda pulsed constant-voltage supply it is shown that the HIPIMS dischargestypically exhibit an initial pressure dependent current peak followed bya second phase that is power and material dependent. This suggests thatthe initial phase of a HIPIMS