Download or Read online Handbook of Thin Film Deposition Processes and Techniques full in PDF, ePub and kindle. this book written by Krishna Seshan and published by William Andrew which was released on 01 February 2001 with total page 430 pages. We cannot guarantee that Handbook of Thin Film Deposition Processes and Techniques book is available in the library, click Get Book button and read full online book in your kindle, tablet, IPAD, PC or mobile whenever and wherever You Like. New second edition of the popular book on deposition (first edition by Klaus Schruegraf) for engineers, technicians, and plant personnel in the semiconductor and related industries. This book traces the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. The book includes much cutting-edge material. Entirely new chapters on contamination and contamination control describe the basics and the issues—as feature sizes shrink to sub-micron dimensions, cleanliness and particle elimination has to keep pace. A new chapter on metrology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together all the physical vapor deposition techniques. Two entirely new areas receive full treatment: chemical mechanical polishing which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.
Handbook of Thin Film Deposition Processes and Techniques
- Author : Krishna Seshan
- Publisher : William Andrew
- Pages : 430 pages
- ISBN : 0815517785
- Release : 01 February 2001
- Rating : /5 from reviews
