Handbook Of Thin Film Deposition

✏Book Title : Handbook of Thin Film Deposition
✏Author : Krishna Seshan
✏Publisher : William Andrew
✏Release Date : 2012-12-06
✏Pages : 408
✏ISBN : 9781437778748
✏Available Language : English, Spanish, And French

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✏Handbook of Thin Film Deposition Book Summary : The Handbook of Thin Film Deposition is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, new materials for memory applications and methods for thin film optical processes. In a major restructuring, this edition of the handbook lays the foundations with an up-to-date treatment of lithography, contamination and yield management, and reliability of thin films. The established physical and chemical deposition processes and technologies are then covered, the last section of the book being devoted to more recent technological developments such as microelectromechanical systems, photovoltaic applications, digital cameras, CCD arrays, and optical thin films. A practical survey of thin film technologies aimed at engineers and managers involved in all stages of the process: design, fabrication, quality assurance and applications Covers core processes and applications in the semiconductor industry and new developments in the photovoltaic and optical thin film industries The new edition takes covers the transition taking place in the semiconductor world from Al/SiO2 to copper interconnects with low-k dielectrics Written by acknowledged industry experts from key companies in the semiconductor industry including Intel and IBM Foreword by Gordon E. Moore, co-founder of Intel and formulator of the renowned ‘Moore’s Law’ relating to the technology development cycle in the semiconductor industry

✏Book Title : Handbook of Thin Film Deposition
✏Author : Krishna Seshan
✏Publisher : William Andrew
✏Release Date : 2018-02-23
✏Pages : 470
✏ISBN : 9780128123126
✏Available Language : English, Spanish, And French

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✏Handbook of Thin Film Deposition Book Summary : Handbook of Thin Film Deposition, Fourth Edition, is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, materials for memory applications and methods for thin film optical processes. The book is broken up into three sections: scaling, equipment and processing, and applications. In this newly revised edition, the handbook will also explore the limits of thin film applications, most notably as they relate to applications in manufacturing, materials, design and reliability. Offers a practical survey of thin film technologies aimed at engineers and managers involved in all stages of the process: design, fabrication, quality assurance, applications and the limitations faced by those processes Covers core processes and applications in the semiconductor industry and new developments within the photovoltaic and optical thin film industries Features a new chapter discussing Gates Dielectrics

✏Book Title : Handbook of Thin Film Deposition Processes and Techniques
✏Author : Krishna Seshan
✏Publisher : William Andrew
✏Release Date : 2001-02-01
✏Pages : 430
✏ISBN : 9780815517788
✏Available Language : English, Spanish, And French

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✏Handbook of Thin Film Deposition Processes and Techniques Book Summary : New second edition of the popular book on deposition (first edition by Klaus Schruegraf) for engineers, technicians, and plant personnel in the semiconductor and related industries. This book traces the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. The book includes much cutting-edge material. Entirely new chapters on contamination and contamination control describe the basics and the issues—as feature sizes shrink to sub-micron dimensions, cleanliness and particle elimination has to keep pace. A new chapter on metrology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together all the physical vapor deposition techniques. Two entirely new areas receive full treatment: chemical mechanical polishing which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.

✏Book Title : Handbook of Thin film Deposition Processes and Techniques
✏Author : Klaus K. Schuegraf
✏Publisher : William Andrew
✏Release Date : 1988
✏Pages : 413
✏ISBN : UOM:39015012052265
✏Available Language : English, Spanish, And French

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✏Handbook of Thin film Deposition Processes and Techniques Book Summary : The most recent developments and techniques in thin film deposition for high technology applications are described by 23 authorities in the field.

✏Book Title : Handbook of Thin Film Deposition Techniques Principles Methods Equipment and Applications Second Editon
✏Author : Krishna Seshan
✏Publisher : CRC Press
✏Release Date : 2002-02-01
✏Pages : 72
✏ISBN : 9781482269680
✏Available Language : English, Spanish, And French

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✏Handbook of Thin Film Deposition Techniques Principles Methods Equipment and Applications Second Editon Book Summary : The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition tec

✏Book Title : Handbook of Thin Film Deposition Techniques Principles Methods Equipment and Applications Second Editon
✏Author : Krishna Seshan
✏Publisher : CRC Press
✏Release Date : 2002-02-01
✏Pages : 72
✏ISBN : 0815514425
✏Available Language : English, Spanish, And French

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✏Handbook of Thin Film Deposition Techniques Principles Methods Equipment and Applications Second Editon Book Summary : The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. This second edition explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of submicron dimensions. The book covers PVD, laser and E-beam assisted deposition, MBE, and ion beam methods to bring together all of the physical vapor deposition techniques. The book also includes coverage of chemical mechanical polishing that helps attain the flatness that is required by modern lithography methods and new materials used for interconnect dielectric materials, specifically organic polyimide materials.

✏Book Title : Handbook of Thin Film Deposition Processes and Techniques
✏Author : Krishna Seshan
✏Publisher : William Andrew
✏Release Date : 2001-12-31
✏Pages : 430
✏ISBN : 9780080946788
✏Available Language : English, Spanish, And French

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✏Handbook of Thin Film Deposition Processes and Techniques Book Summary : New second edition of the popular book on deposition (first edition by Klaus Schruegraf) for engineers, technicians, and plant personnel in the semiconductor and related industries. This book traces the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. The book includes much cutting-edge material. Entirely new chapters on contamination and contamination control describe the basics and the issuesùas feature sizes shrink to sub-micron dimensions, cleanliness and particle elimination has to keep pace. A new chapter on metrology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together all the physical vapor deposition techniques. Two entirely new areas receive full treatment: chemical mechanical polishing which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.

✏Book Title : Handbook of Thin Film Technology
✏Author : Hartmut Frey
✏Publisher : Springer Science & Business Media
✏Release Date : 2015-05-06
✏Pages : 380
✏ISBN : 9783642054303
✏Available Language : English, Spanish, And French

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✏Handbook of Thin Film Technology Book Summary : “Handbook of Thin Film Technology” covers all aspects of coatings preparation, characterization and applications. Different deposition techniques based on vacuum and plasma processes are presented. Methods of surface and thin film analysis including coating thickness, structural, optical, electrical, mechanical and magnetic properties of films are detailed described. The several applications of thin coatings and a special chapter focusing on nanoparticle-based films can be found in this handbook. A complete reference for students and professionals interested in the science and technology of thin films.

✏Book Title : Handbook of Thin Film Materials Deposition and processing of thin films
✏Author : Hari Singh Nalwa
✏Publisher :
✏Release Date : 2002
✏Pages : 706
✏ISBN : 0125129092
✏Available Language : English, Spanish, And French

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✏Handbook of Thin Film Materials Deposition and processing of thin films Book Summary : Vol.1: Deposition and processing of thin films; Vol.2: Characterization and spectroscopy of thin films; Vol.3: Ferroelectric and dielectric thin films; Vol.4: Semiconductor and superconductor thin films; Vol.5: Nanomaterials and magnetic thin flims

✏Book Title : Handbook of Thin Film Materials Deposition and processing of thin films
✏Author : Hari Singh Nalwa
✏Publisher :
✏Release Date : 2002
✏Pages : 706
✏ISBN : 0125129092
✏Available Language : English, Spanish, And French

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✏Handbook of Thin Film Materials Deposition and processing of thin films Book Summary : Vol.1: Deposition and processing of thin films; Vol.2: Characterization and spectroscopy of thin films; Vol.3: Ferroelectric and dielectric thin films; Vol.4: Semiconductor and superconductor thin films; Vol.5: Nanomaterials and magnetic thin flims

✏Book Title : Handbook of Thin Film Process Technology
✏Author : David A. Glocker
✏Publisher :
✏Release Date : 1995
✏Pages :
✏ISBN : 0750303115
✏Available Language : English, Spanish, And French

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✏Handbook of Thin Film Process Technology Book Summary :

✏Book Title : Handbook of Thin Film Materials Characterization and spectroscopy of thin films
✏Author : Hari Singh Nalwa
✏Publisher :
✏Release Date : 2002
✏Pages : 773
✏ISBN : UOM:39015053130913
✏Available Language : English, Spanish, And French

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✏Handbook of Thin Film Materials Characterization and spectroscopy of thin films Book Summary : Vol.1: Deposition and processing of thin films; Vol.2: Characterization and spectroscopy of thin films; Vol.3: Ferroelectric and dielectric thin films; Vol.4: Semiconductor and superconductor thin films; Vol.5: Nanomaterials and magnetic thin flims

✏Book Title : Handbook of Thin Film Materials Ferroelectric and dielectric thin films
✏Author : Hari Singh Nalwa
✏Publisher :
✏Release Date : 2002
✏Pages : 634
✏ISBN : 0125129114
✏Available Language : English, Spanish, And French

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✏Handbook of Thin Film Materials Ferroelectric and dielectric thin films Book Summary : Vol.1: Deposition and processing of thin films; Vol.2: Characterization and spectroscopy of thin films; Vol.3: Ferroelectric and dielectric thin films; Vol.4: Semiconductor and superconductor thin films; Vol.5: Nanomaterials and magnetic thin flims

✏Book Title : Handbook of Deposition Technologies for Films and Coatings
✏Author : Peter M. Martin
✏Publisher : William Andrew
✏Release Date : 2009-12-01
✏Pages : 936
✏ISBN : 9780815520320
✏Available Language : English, Spanish, And French

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✏Handbook of Deposition Technologies for Films and Coatings Book Summary : This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications. * Explains in depth the many recent i

✏Book Title : Handbook of Thin Film Materials Semiconductor and superconductor thin films
✏Author : Hari Singh Nalwa
✏Publisher :
✏Release Date : 2002
✏Pages : 705
✏ISBN : 0125129122
✏Available Language : English, Spanish, And French

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✏Handbook of Thin Film Materials Semiconductor and superconductor thin films Book Summary : Vol.1: Deposition and processing of thin films; Vol.2: Characterization and spectroscopy of thin films; Vol.3: Ferroelectric and dielectric thin films; Vol.4: Semiconductor and superconductor thin films; Vol.5: Nanomaterials and magnetic thin flims

✏Book Title : Handbook of Thin Film Materials Nanomaterials and magnetic thin films
✏Author : Hari Singh Nalwa
✏Publisher :
✏Release Date : 2002
✏Pages : 633
✏ISBN : 0125129130
✏Available Language : English, Spanish, And French

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✏Handbook of Thin Film Materials Nanomaterials and magnetic thin films Book Summary : Vol.1: Deposition and processing of thin films; Vol.2: Characterization and spectroscopy of thin films; Vol.3: Ferroelectric and dielectric thin films; Vol.4: Semiconductor and superconductor thin films; Vol.5: Nanomaterials and magnetic thin flims

✏Book Title : Thin Film Processes II
✏Author : John L. Vossen
✏Publisher : Gulf Professional Publishing
✏Release Date : 1991
✏Pages : 866
✏ISBN : 0127282513
✏Available Language : English, Spanish, And French

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✏Thin Film Processes II Book Summary : This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature. Though edited to stand alone, when taken together, Thin Film Processes II and its predecessor present a thorough grounding in modern thin film techniques. Key Features * Provides an all-new sequel to the 1978 classic, Thin Film Processes * Introduces new topics, and several key topics presented in the original volume are updated * Emphasizes practical applications of major thin film deposition and etching processes * Helps readers find the appropriate technology for a particular application

✏Book Title : Handbook of Optical Properties
✏Author : Rolf E. Hummel
✏Publisher : CRC Press
✏Release Date : 1995-02-24
✏Pages : 384
✏ISBN : 084932484X
✏Available Language : English, Spanish, And French

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✏Handbook of Optical Properties Book Summary : Thin Films for Optical Coating emphasizes the applications of thin films, deposition of thin films, and thin film characterization. Unlike monographs on this subject, this book presents the views of many expert authors. Individual chapters span a wide arc of topics within this field of study. The book offers an introduction to usual and unusual applications of optical thin films, treating in a more qualitative way general topics such as anticounterfeiting coatings, decorative coatings, light switches, contrast enhancement coatings, multiplexers, optical memories, and more. Contributors review thin film media for optical data storage, UV broadband and narrow-band filters, and optically active thin film coatings. Ion beam sputtering and magnetron sputtering deposition methods are described in detail. Characterization techniques are provided, including Raman spectroscopy and absorption measurements. The book also offers theories on light scattering of thin dielectric films and the electromagnetic properties of nanocermet thin films. This reference incorporates recent research by the individual authors with their views of current developments in their respective fields. Of particular interest to the reader will be an assessment of the historical developments of thin film physics written by one of the fathers of thin film technology, Professor M. Auwärter.

✏Book Title : Thin Film Technology Handbook
✏Author : Aicha Elshabini
✏Publisher : McGraw Hill Professional
✏Release Date : 1998
✏Pages : 640
✏ISBN : 0070190259
✏Available Language : English, Spanish, And French

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✏Thin Film Technology Handbook Book Summary : The most comprehensive source available on the preparation, characterization, and emerging applications of thin film. This book features extensive new advances applied in multichip modules (MCMs), and covers the basic principles and applications of thin film deposition techniques for practical use. It provides and develops design guidelines to realize multilayer structures in microcircuits, thus addressing a critical and rapidly growing area.

✏Book Title : Handbook of Thin Films Five Volume Set
✏Author : Hari Singh Nalwa
✏Publisher : Elsevier
✏Release Date : 2001-11-17
✏Pages : 3451
✏ISBN : 9780080533247
✏Available Language : English, Spanish, And French

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✏Handbook of Thin Films Five Volume Set Book Summary : This five-volume handbook focuses on processing techniques, characterization methods, and physical properties of thin films (thin layers of insulating, conducting, or semiconductor material). The editor has composed five separate, thematic volumes on thin films of metals, semimetals, glasses, ceramics, alloys, organics, diamonds, graphites, porous materials, noncrystalline solids, supramolecules, polymers, copolymers, biopolymers, composites, blends, activated carbons, intermetallics, chalcogenides, dyes, pigments, nanostructured materials, biomaterials, inorganic/polymer composites, organoceramics, metallocenes, disordered systems, liquid crystals, quasicrystals, and layered structures. Thin films is a field of the utmost importance in today's materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Advanced, high-performance computers, high-definition TV, digital camcorders, sensitive broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are but a few examples of miniaturized device technologies that depend the utilization of thin film materials. The Handbook of Thin Films Materials is a comprehensive reference focusing on processing techniques, characterization methods, and physical properties of these thin film materials.

✏Book Title : Handbook of Deposition Technologies for Films and Coatings
✏Author : Rointan Framroze Bunshah
✏Publisher : William Andrew
✏Release Date : 1994
✏Pages : 861
✏ISBN : 9780815513377
✏Available Language : English, Spanish, And French

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✏Handbook of Deposition Technologies for Films and Coatings Book Summary : This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications.

✏Book Title : Handbook of Sputter Deposition Technology
✏Author : Kiyotaka Wasa
✏Publisher : William Andrew
✏Release Date : 2012
✏Pages : 644
✏ISBN : 9781437734836
✏Available Language : English, Spanish, And French

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✏Handbook of Sputter Deposition Technology Book Summary : Sputtering is a Physical Vapor Deposition vacuum process used to deposit very thin films onto a substrate for a wide variety of commercial and scientific purposes. Sputtering occurs when an ionized gas molecule is used to displace atoms of a specific material. These atoms then bond at the atomic level to a substrate and create a thin film. Several types of sputtering processes exist, including: ion beam, diode, and magnetron sputtering. Cathode sputtering is widely used in the microelectronics industry for silicon integrated circuit production and for metallic coatings. High temperature, diamond films and ferroelectric materials are other applications. Sputtering applications are important across a wide range of industries, including the automotive, medical, semiconductors, space, plastics, and military sectors. A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available. All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique. 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere.

✏Book Title : Optical Thin Films
✏Author : James D. Rancourt
✏Publisher : SPIE Press
✏Release Date : 1996
✏Pages : 289
✏ISBN : 0819422851
✏Available Language : English, Spanish, And French

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✏Optical Thin Films Book Summary : Practical, user-oriented reference for engineers who must incorporate and specify coatings for filters, antiglare effects, polarization, or other purposes in optical or electro-optical systems design. It focuses on preparation techniques and characteristics of commercially available products and provides information needed to determine what type of filter is needed to solve a particular problem, what its limitations are, and how to care for it.

✏Book Title : Chemical Physics of Thin Film Deposition Processes for Micro and Nano Technologies
✏Author : Y. Pauleau
✏Publisher : Springer Science & Business Media
✏Release Date : 2012-12-06
✏Pages : 363
✏ISBN : 9789401003537
✏Available Language : English, Spanish, And French

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✏Chemical Physics of Thin Film Deposition Processes for Micro and Nano Technologies Book Summary : An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.

✏Book Title : Handbook of Ion Beam Processing Technology
✏Author : Jerome J. Cuomo
✏Publisher : William Andrew
✏Release Date : 1989
✏Pages : 438
✏ISBN : UOM:39015047473080
✏Available Language : English, Spanish, And French

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✏Handbook of Ion Beam Processing Technology Book Summary : Deals with ion beam processing for basic sputter etching of samples, sputter deposition of thin films, the synthesis of material in thin film form, and the modification of the properties of thin films.

✏Book Title : Handbook of Physical Vapor Deposition PVD Processing
✏Author : D. M. Mattox
✏Publisher : Cambridge University Press
✏Release Date : 2014-09-19
✏Pages : 944
✏ISBN : 0080946585
✏Available Language : English, Spanish, And French

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✏Handbook of Physical Vapor Deposition PVD Processing Book Summary : This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.

✏Book Title : Handbook of Hard Coatings
✏Author : Rointan F. Bunshah
✏Publisher : Cambridge University Press
✏Release Date : 2001
✏Pages : 550
✏ISBN : 0815514387
✏Available Language : English, Spanish, And French

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✏Handbook of Hard Coatings Book Summary : Written by 12 leading experts, this is an essential resource for fabrication, characterization and applications in the field of hard coatings and wear resistant surfaces. Offering complete explanations of commercially oriented deposition technology, from traditional vacuum. Includes a detailed introduction to the science of characterizing and measuring hard coatings.

✏Book Title : Handbook of Thin Film Materials Characterization and spectroscopy of thin films
✏Author : Hari Singh Nalwa
✏Publisher :
✏Release Date : 2002
✏Pages : 773
✏ISBN : UOM:39015053130913
✏Available Language : English, Spanish, And French

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✏Handbook of Thin Film Materials Characterization and spectroscopy of thin films Book Summary : Vol.1: Deposition and processing of thin films; Vol.2: Characterization and spectroscopy of thin films; Vol.3: Ferroelectric and dielectric thin films; Vol.4: Semiconductor and superconductor thin films; Vol.5: Nanomaterials and magnetic thin flims

✏Book Title : Deposition Technologies for Films and Coatings
✏Author : Rointan Framroze Bunshah
✏Publisher : William Andrew
✏Release Date : 1982
✏Pages : 585
✏ISBN : UOM:39015000997372
✏Available Language : English, Spanish, And French

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✏Deposition Technologies for Films and Coatings Book Summary :

✏Book Title : Handbook of sol gel science and technology 1 Sol gel processing
✏Author : Sumio Sakka
✏Publisher : Springer Science & Business Media
✏Release Date : 2005
✏Pages : 680
✏ISBN : 1402079664
✏Available Language : English, Spanish, And French

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✏Handbook of sol gel science and technology 1 Sol gel processing Book Summary : Since Dr. Disiich of Germany prepared a glass lens by the sol-gel method around 1970, sol-gel science and technology has continued to develop. Since then this field has seen remarkable technical developments as well as a broadening of the applications of sol-gel science and technology. There is a growing need for a comprehensive reference that treats both the fundamentals and the applications, and this is the aim of "Handbook of Sol-Gel Science and Technology."The primary purpose of sol-gel science and technology is to produce materials, active and non-active including optical, electronic, chemical, sensor, bio- and structural materials. This means that sol-gel science and technology is related to all kinds of manufacturing industries. Thus Volume 1, "Sol-Gel Processing," is devoted to general aspects of processing. Newly developed materials such as organic-inorganic hybrids, photonic crystals, ferroelectric coatings, photocatalysts will be covered. Topics in this volume include: Volume 2, "Characterization of Sol-Gel Materials and Products, "highlights the important fact that useful materials are only produced when characterization is tied to processing. Furthermore, characterization is essential to the understanding of nanostructured materials, and sol-gel technology is a most important technology in this new field. Since nanomaterials display their functional property based on their nano- and micro-structure, "characterization" is very important. Topics found in Volume 2 include: Sol-gel technology is a versatile technology, making it possible to produce a wide variety of materials and to provide existing substances with novel properties. This technology was applied to producingnovel materials, for example organic-inorganic hybrids, which are quite difficult to make by other fabricating techniques, and it was also applied to producing materials based on high temperature superconducting oxides. "Applications of Sol-Gel Technology," (Volume 3), will cover applications such as: