Handbook Of Sputter Deposition Technology

✏Book Title : Handbook of Sputter Deposition Technology
✏Author : Kiyotaka Wasa
✏Publisher : William Andrew
✏Release Date : 2012
✏Pages : 644
✏ISBN : 9781437734836
✏Available Language : English, Spanish, And French

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✏Handbook of Sputter Deposition Technology Book Summary : Sputtering is a Physical Vapor Deposition vacuum process used to deposit very thin films onto a substrate for a wide variety of commercial and scientific purposes. Sputtering occurs when an ionized gas molecule is used to displace atoms of a specific material. These atoms then bond at the atomic level to a substrate and create a thin film. Several types of sputtering processes exist, including: ion beam, diode, and magnetron sputtering. Cathode sputtering is widely used in the microelectronics industry for silicon integrated circuit production and for metallic coatings. High temperature, diamond films and ferroelectric materials are other applications. Sputtering applications are important across a wide range of industries, including the automotive, medical, semiconductors, space, plastics, and military sectors. A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available. All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique. 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere.

✏Book Title : Handbook of Sputter Deposition Technology
✏Author : Shigeru Hayakawa
✏Publisher : William Andrew Publishing
✏Release Date : 1992-01-01
✏Pages : 304
✏ISBN : 0815512805
✏Available Language : English, Spanish, And French

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✏Handbook of Sputter Deposition Technology Book Summary : A concise, comprehensive overview of sputter deposition technologyùa key technology for materials research in the next decade. Cathode sputtering is widely used in the microelectronics industry for silicon integrated circuit production and for metallurgical coatings. High temperature superconductors can be synthesized with sputtering under non-equilibrium conditions. Diamond films and ferroelectric materials are other applications.

✏Book Title : Handbook of Deposition Technologies for Films and Coatings
✏Author : Peter M. Martin
✏Publisher : William Andrew
✏Release Date : 2009-12-01
✏Pages : 936
✏ISBN : 9780815520320
✏Available Language : English, Spanish, And French

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✏Handbook of Deposition Technologies for Films and Coatings Book Summary : This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications. * Explains in depth the many recent i

✏Book Title : Handbook of Deposition Technologies for Films and Coatings
✏Author : Rointan Framroze Bunshah
✏Publisher : William Andrew
✏Release Date : 1994
✏Pages : 861
✏ISBN : 9780815513377
✏Available Language : English, Spanish, And French

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✏Handbook of Deposition Technologies for Films and Coatings Book Summary : This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications.

✏Book Title : Handbook of Thin Film Deposition Processes and Techniques
✏Author : Krishna Seshan
✏Publisher : William Andrew
✏Release Date : 2001-02-01
✏Pages : 430
✏ISBN : 9780815517788
✏Available Language : English, Spanish, And French

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✏Handbook of Thin Film Deposition Processes and Techniques Book Summary : New second edition of the popular book on deposition (first edition by Klaus Schruegraf) for engineers, technicians, and plant personnel in the semiconductor and related industries. This book traces the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. The book includes much cutting-edge material. Entirely new chapters on contamination and contamination control describe the basics and the issues—as feature sizes shrink to sub-micron dimensions, cleanliness and particle elimination has to keep pace. A new chapter on metrology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together all the physical vapor deposition techniques. Two entirely new areas receive full treatment: chemical mechanical polishing which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.

✏Book Title : Handbook of Physical Vapor Deposition PVD Processing
✏Author : D. M. Mattox
✏Publisher : Cambridge University Press
✏Release Date : 2014-09-19
✏Pages : 944
✏ISBN : 0080946585
✏Available Language : English, Spanish, And French

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✏Handbook of Physical Vapor Deposition PVD Processing Book Summary : This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.

✏Book Title : Handbook of Hard Coatings
✏Author : Rointan F. Bunshah
✏Publisher : Cambridge University Press
✏Release Date : 2001
✏Pages : 550
✏ISBN : 0815514387
✏Available Language : English, Spanish, And French

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✏Handbook of Hard Coatings Book Summary : Written by 12 leading experts, this is an essential resource for fabrication, characterization and applications in the field of hard coatings and wear resistant surfaces. Offering complete explanations of commercially oriented deposition technology, from traditional vacuum. Includes a detailed introduction to the science of characterizing and measuring hard coatings.

✏Book Title : Handbook of Ion Beam Processing Technology
✏Author : Jerome J. Cuomo
✏Publisher : William Andrew
✏Release Date : 1989
✏Pages : 438
✏ISBN : UOM:39015047473080
✏Available Language : English, Spanish, And French

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✏Handbook of Ion Beam Processing Technology Book Summary : Deals with ion beam processing for basic sputter etching of samples, sputter deposition of thin films, the synthesis of material in thin film form, and the modification of the properties of thin films.

✏Book Title : Handbook of Optical Properties
✏Author : Rolf E. Hummel
✏Publisher : CRC Press
✏Release Date : 1995-02-24
✏Pages : 384
✏ISBN : 084932484X
✏Available Language : English, Spanish, And French

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✏Handbook of Optical Properties Book Summary : Thin Films for Optical Coating emphasizes the applications of thin films, deposition of thin films, and thin film characterization. Unlike monographs on this subject, this book presents the views of many expert authors. Individual chapters span a wide arc of topics within this field of study. The book offers an introduction to usual and unusual applications of optical thin films, treating in a more qualitative way general topics such as anticounterfeiting coatings, decorative coatings, light switches, contrast enhancement coatings, multiplexers, optical memories, and more. Contributors review thin film media for optical data storage, UV broadband and narrow-band filters, and optically active thin film coatings. Ion beam sputtering and magnetron sputtering deposition methods are described in detail. Characterization techniques are provided, including Raman spectroscopy and absorption measurements. The book also offers theories on light scattering of thin dielectric films and the electromagnetic properties of nanocermet thin films. This reference incorporates recent research by the individual authors with their views of current developments in their respective fields. Of particular interest to the reader will be an assessment of the historical developments of thin film physics written by one of the fathers of thin film technology, Professor M. Auwärter.

✏Book Title : Handbook of Thin Film Technology
✏Author : Hartmut Frey
✏Publisher : Springer Science & Business Media
✏Release Date : 2015-05-06
✏Pages : 380
✏ISBN : 9783642054303
✏Available Language : English, Spanish, And French

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✏Handbook of Thin Film Technology Book Summary : “Handbook of Thin Film Technology” covers all aspects of coatings preparation, characterization and applications. Different deposition techniques based on vacuum and plasma processes are presented. Methods of surface and thin film analysis including coating thickness, structural, optical, electrical, mechanical and magnetic properties of films are detailed described. The several applications of thin coatings and a special chapter focusing on nanoparticle-based films can be found in this handbook. A complete reference for students and professionals interested in the science and technology of thin films.

✏Book Title : Handbook of Industrial Refractories Technology
✏Author : Stephen Caniglia
✏Publisher : William Andrew
✏Release Date : 1992-12-31
✏Pages : 650
✏ISBN : 9780815517566
✏Available Language : English, Spanish, And French

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✏Handbook of Industrial Refractories Technology Book Summary : Encompasses the entire range of industrial refractory materials and forms: properties and their measurement, applications, manufacturing, installation and maintenance techniques, quality assurance, and statistical process control.

✏Book Title : Handbook of Thin Film Deposition Techniques Principles Methods Equipment and Applications Second Editon
✏Author : Krishna Seshan
✏Publisher : CRC Press
✏Release Date : 2002-02-01
✏Pages : 72
✏ISBN : 9781482269680
✏Available Language : English, Spanish, And French

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✏Handbook of Thin Film Deposition Techniques Principles Methods Equipment and Applications Second Editon Book Summary : The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition tec

✏Book Title : Handbook of Vacuum Science and Technology
✏Author : Dorothy Hoffman
✏Publisher : Elsevier
✏Release Date : 1997-10-29
✏Pages : 835
✏ISBN : 0080533752
✏Available Language : English, Spanish, And French

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✏Handbook of Vacuum Science and Technology Book Summary : The Handbook of Vacuum Technology consists of the latest innovations in vacuum science and technology with a strong orientation towards the vacuum practitioner. It covers many of the new vacuum pumps, materials, equipment, and applications. It also details the design and maintenance of modern vacuum systems. The authors are well known experts in their individual fields with the emphasis on performance, limitations, and applications rather than theory. There aremany useful tables, charts, and figures that will be of use to the practitioner. User oriented with many useful tables, charts, and figures of use to the practitioner Reviews new vacuum materials and equipment Illustrates the design and maintenance of modern vacuum systems Includes well referenced chapters

✏Book Title : Handbook of Thin film Deposition Processes and Techniques
✏Author : Klaus K. Schuegraf
✏Publisher : William Andrew
✏Release Date : 1988
✏Pages : 413
✏ISBN : UOM:39015012052265
✏Available Language : English, Spanish, And French

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✏Handbook of Thin film Deposition Processes and Techniques Book Summary : The most recent developments and techniques in thin film deposition for high technology applications are described by 23 authorities in the field.

✏Book Title : Slow Heavy Particle Induced Electron Emission from Solid Surfaces
✏Author : Hannspeter Winter
✏Publisher : Springer Science & Business Media
✏Release Date : 2007-05-03
✏Pages : 246
✏ISBN : 9783540707882
✏Available Language : English, Spanish, And French

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✏Slow Heavy Particle Induced Electron Emission from Solid Surfaces Book Summary : The emission of electrons from solid surfaces bombarded by slow neutral and ionized heavy particles (atoms, molecules) is reviewed both theoretically and in the light of recent experimental studies by leading groups in the field. The book integrates physics of ion beams, surfaces and chemical physics, and serves both as a reference work for researchers and a textbook for graduate students.

✏Book Title : Coatings Technology Handbook Second Edition
✏Author : D. Satas
✏Publisher : CRC Press
✏Release Date : 2000-11-01
✏Pages : 918
✏ISBN : 0824704398
✏Available Language : English, Spanish, And French

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✏Coatings Technology Handbook Second Edition Book Summary : Serving as an all-in-one guide to the entire field of coatings technology, this encyclopedic reference covers a diverse range of topics-including basic concepts, coating types, materials, processes, testing, and applications- and summarizes the latest developments and standard coating methods. Helping readers apply the best coatings for their product needs, the book provides the insights and experience of over 100 recognized experts in over 100 chapters to select. Emphasizing an interdisciplinary exchange of ideas and approaches, the book is illustrated with more than 350 drawings and photographs, plus early 1400 literature references, equations, and tables.

✏Book Title : Handbook of Semiconductor Wafer Cleaning Technology
✏Author : Werner Kern
✏Publisher : William Andrew
✏Release Date : 1993
✏Pages : 623
✏ISBN : UOM:39015029095125
✏Available Language : English, Spanish, And French

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✏Handbook of Semiconductor Wafer Cleaning Technology Book Summary : "The cleaning of semiconductor wafers has become one of the most critical operations in the fabrication of semiconductor devices. The considerable body of technical and scientific literature is widely dispersed in numerous journals and symposia proceedings. This book brings together in one volume all pertinent knowledge on semiconductor wafer cleaning and its associated scientific and technical disciplines. It provides the first comprehensive and up-to-date coverage of this rapidly evolving field. Its thirteen chapters were written by nineteen scientists who are recognized experts in each topic." "The scope of this book is very broad, covering all aspects of wafer cleaning. Emphasis is on practical applications in the fab combined with authoritative scientific background information to provide a solid scientific basis for understanding the chemical and physical processes involved in cleaning and in the analytical methods of testing and evaluation." "The depth and breadth of the material should appeal to those new in the field as well as to experienced professionals. The volume is intended to serve as a handbook for practitioners and professionals in the field of semiconductor microelectronics, including fab engineers, scientists and technicians. It should also prove useful to manufacturers of processing equipment, persons concerned with contamination control and analysis, and students attending advanced or specialized technical courses."--BOOK JACKET.Title Summary field provided by Blackwell North America, Inc. All Rights Reserved

✏Book Title : Semiconductor Industrial Hygiene Handbook
✏Author : Michael E. Williams
✏Publisher : William Andrew
✏Release Date : 1995
✏Pages : 348
✏ISBN : UOM:39015033996797
✏Available Language : English, Spanish, And French

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✏Semiconductor Industrial Hygiene Handbook Book Summary : This book provides a comprehensive review of the primary industrial hygiene topics relevant to semiconductor processing: chemical and physical agents, and ventilation systems. The book also has excellent chapters on newer industrial hygiene concerns that are not specific to the semiconductor industry: ergonomics, indoor air quality, personal protective equipment, plan review, and records retention. While much of the information in these chapters can be applied to all industries, the focus and orientation is specific to issues in the semiconductor industry.

✏Book Title : Handbook of Carbon Graphite Diamonds and Fullerenes
✏Author : Hugh O. Pierson
✏Publisher : William Andrew
✏Release Date : 1993
✏Pages : 399
✏ISBN : UOM:39015032939384
✏Available Language : English, Spanish, And French

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✏Handbook of Carbon Graphite Diamonds and Fullerenes Book Summary : This book is a review of the science and technology of the element carbon and its allotropes: graphite, diamond and the fullerenes. This field has expanded greatly in the last three decades stimulated by many major discoveries such as carbon fibers, low-pressure diamond and the fullerenes. These carbon materials are very different in structure and properties. Some are very old (charcoal), others new (the fullerenes). They have different applications and markets and are produced by different segments of the industry.

✏Book Title : Handbook of VLSI Microlithography
✏Author : William B. Glendinning
✏Publisher : William Andrew
✏Release Date : 1991-01-15
✏Pages : 649
✏ISBN : UOM:39015025011233
✏Available Language : English, Spanish, And French

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✏Handbook of VLSI Microlithography Book Summary : This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.

✏Book Title : Optical Thin Films
✏Author : James D. Rancourt
✏Publisher : SPIE Press
✏Release Date : 1996
✏Pages : 289
✏ISBN : 0819422851
✏Available Language : English, Spanish, And French

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✏Optical Thin Films Book Summary : Practical, user-oriented reference for engineers who must incorporate and specify coatings for filters, antiglare effects, polarization, or other purposes in optical or electro-optical systems design. It focuses on preparation techniques and characteristics of commercially available products and provides information needed to determine what type of filter is needed to solve a particular problem, what its limitations are, and how to care for it.

✏Book Title : Diamond Chemical Vapor Deposition
✏Author : Huimin Liu
✏Publisher : William Andrew
✏Release Date : 1995
✏Pages : 195
✏ISBN : UOM:39015037418418
✏Available Language : English, Spanish, And French

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✏Diamond Chemical Vapor Deposition Book Summary : This book presents an updated, systematic review of the latest developments in diamond CVD processes, with emphasis on the nucleation and early growth of diamond CVD. The objective is to familiarize the reader with the scientific and engineering aspects of diamond CVD, and to provide experiences researchers, scientists, and engineers in academia and industry with the latest developments in this growing field.

✏Book Title : Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI ULSI Applications
✏Author : John E.J. Schmitz
✏Publisher : William Andrew
✏Release Date : 1992
✏Pages : 235
✏ISBN : UOM:39015024969662
✏Available Language : English, Spanish, And French

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✏Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI ULSI Applications Book Summary : This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments, and applications are described.

✏Book Title : Handbook of Semiconductor Manufacturing Technology Second Edition
✏Author : Yoshio Nishi
✏Publisher : CRC Press
✏Release Date : 2007-07-09
✏Pages : 1720
✏ISBN : 1420017667
✏Available Language : English, Spanish, And French

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✏Handbook of Semiconductor Manufacturing Technology Second Edition Book Summary : Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.

✏Book Title : Glow Discharge Processes
✏Author : Brian Chapman
✏Publisher : Wiley-Interscience
✏Release Date : 1980
✏Pages : 406
✏ISBN : UOM:39015040316237
✏Available Language : English, Spanish, And French

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✏Glow Discharge Processes Book Summary : Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.

✏Book Title : Handbook of Chemical Vapor Deposition
✏Author : Hugh O. Pierson
✏Publisher : William Andrew
✏Release Date : 2012-12-02
✏Pages : 458
✏ISBN : 9781437744880
✏Available Language : English, Spanish, And French

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✏Handbook of Chemical Vapor Deposition Book Summary : Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.

✏Book Title : Handbook of Ceramics Grinding Polishing
✏Author : Ioan D. Marinescu
✏Publisher : William Andrew
✏Release Date : 2000-01-14
✏Pages : 477
✏ISBN : UOM:39015048852662
✏Available Language : English, Spanish, And French

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✏Handbook of Ceramics Grinding Polishing Book Summary : Focusing on the machining of ceramic materials such as silicon nitride, carbide and zirconia, this handbook provides a clear understanding of modern improvements in ceramic processing. The 20 international experts chapter authors describe the properties and characteristics of ceramics, the various types of abrasive processes, and typical tests used in the procedures including cost reduction methods.

✏Book Title : Kirk Othmer Encyclopedia of Chemical Technology Volume 23
✏Author : Kirk-Othmer
✏Publisher : Wiley-Interscience
✏Release Date : 2006-11-10
✏Pages : 912
✏ISBN : 0471484997
✏Available Language : English, Spanish, And French

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✏Kirk Othmer Encyclopedia of Chemical Technology Volume 23 Book Summary : The fifth edition of the Kirk-Othmer Encyclopedia of Chemical Technology builds upon the solid foundation of the previous editions, which have proven to be a mainstay for chemists, biochemists, and engineers at academic, industrial, and government institutions since publication of the first edition in 1949. The new edition includes necessary adjustments and modernization of the content to reflect changes and developments in chemical technology.

✏Book Title : Contacts to Semiconductors
✏Author : L. J. Brillson
✏Publisher : William Andrew
✏Release Date : 1993
✏Pages : 680
✏ISBN : UOM:39015032832589
✏Available Language : English, Spanish, And French

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✏Contacts to Semiconductors Book Summary : The authors present the state of the art in growing, processing, and characterizing electronic junctions. Overall, they have assembled a broad array of the latest semiconductor interface science and technology, ranging from advanced ohmic, Schottky, and heterojunction contacts to the refined perspectives of microscopic junctions gleaned from ultrahigh vacuum surface science techniques. Considerable progress has been made in these areas over the last few years. This book is intended for technologists and solid state researchers alike.

✏Book Title : Ceramic Cutting Tools
✏Author : E. Dow Whitney
✏Publisher : William Andrew
✏Release Date : 1994
✏Pages : 357
✏ISBN : UOM:39015032962063
✏Available Language : English, Spanish, And French

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✏Ceramic Cutting Tools Book Summary : Interest in ceramics as a high speed cutting tool material is based primarily on favorable material properties. As a class of materials, ceramics possess high melting points, excellent hardness and good wear resistance. Unlike most metals, hardness levels in ceramics generally remain high at elevated temperatures which means that cutting tip integrity is relatively unaffected at high cutting speeds. Ceramics are also chemically inert against most workmetals.