Handbook of Sputter Deposition Technology

• Author : Kiyotaka Wasa,Isaku Kanno,Hidetoshi Kotera
• Publisher : William Andrew
• Release : 03 July 2022

Sputtering is a Physical Vapor Deposition vacuum process used to deposit very thin films onto a substrate for a wide variety of commercial and scientific purposes. Sputtering occurs when an ionized gas molecule is used to displace atoms of a specific material. These atoms then bond at the atomic level to a substrate and create a thin film. Several types of sputtering processes exist, including: ion beam, diode, and magnetron sputtering. Cathode sputtering is widely used in the microelectronics industry

• Author : Shigeru Hayakawa
• Publisher : William Andrew Publishing
• Release : 01 January 1992

A concise, comprehensive overview of sputter deposition technologyùa key technology for materials research in the next decade. Cathode sputtering is widely used in the microelectronics industry for silicon integrated circuit production and for metallurgical coatings. High temperature superconductors can be synthesized with sputtering under non-equilibrium conditions. Diamond films and ferroelectric materials are other applications.

• Author : Kiyotaka Wasa
• Publisher : William Andrew
• Release : 31 December 2012

This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems. Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials

• Author : Peter M. Martin
• Publisher : William Andrew
• Release : 01 December 2009

This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications. * Explains in depth the many recent i

• Author : Hugh O. Pierson
• Publisher : William Andrew
• Release : 01 September 1999

Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a

• Author : Donald M. Mattox
• Publisher : William Andrew
• Release : 21 August 2018

The Foundations of Vacuum Coating Technology, Second Edition, is a revised and expanded version of the first edition, which was published in 2003. The book reviews the histories of the various vacuum coating technologies and expands on the history of the enabling technologies of vacuum technology, plasma technology, power supplies, and low-pressure plasma-enhanced chemical vapor deposition. The melding of these technologies has resulted in new processes and products that have greatly expanded the application of vacuum coatings for use in our

• Author : David A Glocker
• Publisher : CRC Press
• Release : 18 January 2018

The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. This handbook is regularly updated with new material, and this volume is a special issue on reactive sputtering which will be of interest to a wide range of industrial and academic researchers in addition to owners of the main Handbook. Some recent developments in the reactive sputtering field are covered, including unbalanced magnetron sputtering and pulsed reactive sputtering. The articles contain

• Author : Kiyotaka Wasa,Makoto Kitabatake,Hideaki Adachi
• Publisher : Springer Science & Business Media
• Release : 24 September 2004

This title contains rich historical coverage of the basics and new experimental and technological information about ceramic thin film and large-area functional coating. Included are principles and examples of making thin-film materials and devices.

• Author : K. Byrappa,Masahiro Yoshimura
• Publisher : Cambridge University Press
• Release : 10 December 2008

Quartz, zeolites, gemstones, perovskite type oxides, ferrite, carbon allotropes, complex coordinated compounds and many moreùall products now being produced using hydrothermal technology. Handbook of Hydrothermal Technology brings together the latest techniques in this rapidly advancing field in one exceptionally useful, long-needed volume. The handbook provides a single source for understanding how aqueous solvents or mineralizers work under temperature and pressure to dissolve and recrystallize normally insoluble materials, and decompose or recycle any waste material. The result, as the authors

• Author : Craig Hoffman,Ronald Driggers
• Publisher : CRC Press
• Release : 22 September 2015

The first edition of the Encyclopedia of Optical and Photonic Engineering provided a valuable reference concerning devices or systems that generate, transmit, measure, or detect light, and to a lesser degree, the basic interaction of light and matter. This Second Edition not only reflects the changes in optical and photonic engineering that have occurred since the first edition was published, but also: Boasts a wealth of new material, expanding the encyclopedia’s length by 25 percent Contains extensive updates, with significant

• Author : James J. Licari,Dale W. Swanson
• Publisher : Elsevier
• Release : 30 August 2005

This book is unique in its comprehensive coverage of all aspects of adhesive technology for microelectronic devices and packaging, from theory to bonding to test procedures. In addition to general applications, such as dies, substrate, and lid and chip stack attachments, the book includes new developments in anisotropic, electrically conductive, and underfill adhesives. Rapid curing methods such as UV, microwave, and moisture (which comply with current environmental and energy requirements) are covered. Over 80 tables and 120 figures provide a wealth of

• Author : Huimin Liu,David S. Dandy
• Publisher : Elsevier
• Release : 31 December 1996

This book presents an updated, systematic review of the latest developments in diamond CVD processes, with emphasis on the nucleation and early growth of diamond CVD. The objective is to familiarize the reader with the scientific and engineering aspects of diamond CVD, and to provide experiences researchers, scientists, and engineers in academia and industry with the latest developments in this growing field.

• Author : William R. Acorn
• Publisher : William Andrew
• Release : 31 December 1994

Facilities which utilize hazardous liquids and gases represent a significant potential liability to the owner, operator, and general public in terms of personnel safety and preservation of assets. It is obvious that a catastrophic incident or loss of property or personnel is to be avoided at all costs. This book was conceived to give the reader a guide to understanding the requirements of the various codes and regulations that apply to the design, construction, and operation of facilities utilizing hazardous

• Author : Krishna Seshan
• Publisher : CRC Press
• Release : 01 February 2002

The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition tec

• Author : Charles Bishop
• Publisher : William Andrew
• Release : 20 December 2006

This new book from William Andrew Publishing is the only practical reference available for anyone employing the roll-to-roll deposition process. Vacuum Deposition onto Webs, Films and Foils is an expansive journey of the process; benefiting manufacturing efficiency, unit cost reduction, and financial results. It is a sweeping approach to the total design of the vacuum deposition process written by a successful and world renowned consultant with three decades of experience. Roll-to-roll deposition processing is a high growth industry and this