Extreme Ultraviolet Euv Lithography

✏Book Title : Extreme Ultraviolet EUV Lithography IX
✏Author : Kenneth A. Goldberg
✏Publisher :
✏Release Date : 2018
✏Pages :
✏ISBN : OCLC:1041610479
✏Available Language : English, Spanish, And French

✏Extreme Ultraviolet EUV Lithography IX Book Summary :

✏Book Title : Extreme Ultraviolet EUV Lithography VIII
✏Author : Eric M. Panning
✏Publisher :
✏Release Date : 2017
✏Pages :
✏ISBN : 1510607382
✏Available Language : English, Spanish, And French

✏Extreme Ultraviolet EUV Lithography VIII Book Summary :

📒Extreme Ultraviolet Euv Lithography ✍ Bruno M. La Fontaine

✏Book Title : Extreme Ultraviolet EUV Lithography
✏Author : Bruno M. La Fontaine
✏Publisher : SPIE-International Society for Optical Engineering
✏Release Date : 2010-01-01
✏Pages : 1064
✏ISBN : 0819480509
✏Available Language : English, Spanish, And French

✏Extreme Ultraviolet EUV Lithography Book Summary : Includes Proceedings Vol. 7821

✏Book Title : Extreme Ultraviolet EUV Lithography III
✏Author :
✏Publisher :
✏Release Date : 2012
✏Pages :
✏ISBN : 0819489786
✏Available Language : English, Spanish, And French

✏Extreme Ultraviolet EUV Lithography III Book Summary :

✏Book Title : Extreme Ultraviolet EUV Lithography X
✏Author : Kenneth A. Goldberg
✏Publisher :
✏Release Date : 2019
✏Pages :
✏ISBN : 1510625615
✏Available Language : English, Spanish, And French

✏Extreme Ultraviolet EUV Lithography X Book Summary :

✏Book Title : Extreme Ultraviolet EUV Lithography III
✏Author :
✏Publisher :
✏Release Date : 2012
✏Pages :
✏ISBN : OCLC:809932864
✏Available Language : English, Spanish, And French

✏Extreme Ultraviolet EUV Lithography III Book Summary :

✏Book Title : Extreme Ultraviolet EUV Lithography VI
✏Author : Obert R. Wood II.
✏Publisher :
✏Release Date : 2015
✏Pages :
✏ISBN : OCLC:907362710
✏Available Language : English, Spanish, And French

✏Extreme Ultraviolet EUV Lithography VI Book Summary : 'Proceedings of SPIE' offers access to the latest innovations in research and technology and are among the most cited references in patent literature.

✏Book Title : Extreme Ultraviolet EUV Lithography V
✏Author :
✏Publisher :
✏Release Date : 2014
✏Pages : 460
✏ISBN : OCLC:931608363
✏Available Language : English, Spanish, And French

✏Extreme Ultraviolet EUV Lithography V Book Summary :

📒Euv Lithography ✍ Vivek Bakshi

✏Book Title : EUV Lithography
✏Author : Vivek Bakshi
✏Publisher : SPIE Press
✏Release Date : 2009
✏Pages : 673
✏ISBN : 9780819469649
✏Available Language : English, Spanish, And French

✏EUV Lithography Book Summary : Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. -- Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.

✏Book Title : Soft X Rays and Extreme Ultraviolet Radiation
✏Author : David Attwood
✏Publisher : Cambridge University Press
✏Release Date : 2007-02-22
✏Pages :
✏ISBN : 9781139643429
✏Available Language : English, Spanish, And French

✏Soft X Rays and Extreme Ultraviolet Radiation Book Summary : This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.