Electromigration in Thin Films and Electronic Devices

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  • Author : Choong-Un Kim
  • Publisher : Elsevier
  • Pages : 352 pages
  • ISBN : 0857093754
  • Rating : /5 from reviews
CLICK HERE TO GET THIS BOOK >>>Electromigration in Thin Films and Electronic Devices

Download or Read online Electromigration in Thin Films and Electronic Devices full in PDF, ePub and kindle. this book written by Choong-Un Kim and published by Elsevier which was released on 28 August 2011 with total page 352 pages. We cannot guarantee that Electromigration in Thin Films and Electronic Devices book is available in the library, click Get Book button and read full online book in your kindle, tablet, IPAD, PC or mobile whenever and wherever You Like. Understanding and limiting electromigration in thin films is essential to the continued development of advanced copper interconnects for integrated circuits. Electromigration in thin films and electronic devices provides an up-to-date review of key topics in this commercially important area. Part one consists of three introductory chapters, covering modelling of electromigration phenomena, modelling electromigration using the peridynamics approach and simulation and x-ray microbeam studies of electromigration. Part two deals with electromigration issues in copper interconnects, including x-ray microbeam analysis, voiding, microstructural evolution and electromigration failure. Finally, part three covers electromigration in solder, with chapters discussing topics such as electromigration-induced microstructural evolution and electromigration in flip-chip solder joints. With its distinguished editor and international team of contributors, Electromigration in thin films and electronic devices is an essential reference for materials scientists and engineers in the microelectronics, packaging and interconnects industries, as well as all those with an academic research interest in the field. Provides up-to-date coverage of the continued development of advanced copper interconnects for integrated circuits Comprehensively reviews modelling of electromigration phenomena, modelling electromigration using the peridynamics approach and simulation, and x-ray microbeam studies of electromigration Deals with electromigration issues in copper interconnects, including x-ray microbeam analysis, voiding, microstructural evolution and electromigration failure

Electromigration in Thin Films and Electronic Devices

Electromigration in Thin Films and Electronic Devices
  • Author : Choong-Un Kim
  • Publisher : Elsevier
  • Release : 28 August 2011
GET THIS BOOK Electromigration in Thin Films and Electronic Devices

Understanding and limiting electromigration in thin films is essential to the continued development of advanced copper interconnects for integrated circuits. Electromigration in thin films and electronic devices provides an up-to-date review of key topics in this commercially important area. Part one consists of three introductory chapters, covering modelling of electromigration phenomena, modelling electromigration using the peridynamics approach and simulation and x-ray microbeam studies of electromigration. Part two deals with electromigration issues in copper interconnects, including x-ray microbeam analysis, voiding, microstructural

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